Q300T D Plus

• Capable of achieving vacuum of 5x10⁻⁵ mbar
• Dual sputter head dual allows sequential coating of samples, up to 150 mm Ø, with two different metals without breaking vacuum
• Touch and swipe capacitive screen
• USB port for upgrades and download of process log files
• Multiple-user profiles can be set up on one instrument
• 16GB of memory can store more than 1000 recipes
• Multi-colour LED visual status indicator
• 1 x Chromium target and 1 x Gold target as standard
• Capable of sputtering non-oxidizing and oxidizing metals e.g. Cr, Ir, W, Al, Ti, Au, Pt

• Large samples e.g Silicon Wafers (up to 200 mm Ø ) or multiple small samples Wafer inspection
• Multiple sample preparation for SEM E Thin-film applications and SEM/FE-SEM

Product Information

• Dual sputter head dual target
• Large Chamber (300 mm Ø)
• Pump-down Vacuum: 5x10⁻⁵ mbar
• Chromium and Gold targets as standard

Instrument case

590 mm W x 535 mm D x 420 mm H (maximum height during the opening of the coating head: 772 mm)

Weight

36 kg (packed: 59 kg)

Packed dimensions

730 mm W x 630 mm D x 690 mm H

Work chamber

Borosilicate glass with integral PET implosion guard Size 300 mm outside diameter x 127 mm High

Display

115.5mm W x 86.4mm H (active area), 640 RGB x 480 (display format), capacitive touch colour display

User interface

Full graphical interface with touch screen buttons, includes features such as a log of the last 1000 coatings and reminders for when maintenance is due

Sputter target

Disc-style 57 mm Ø. A 0.5 mm thick chromium (Cr) and 57 mm Ø. A 0.1 mm thick Gold (Au) is fitted as standard. Pt, Pt/Pd, Pt, Au, Au/Pd, Ni, Ag, Pd, Cu, Cr, W, Al, Ti, Fe, Ir, Co, Sn, Mo, Mg, Ta and ITO target options available in various thicknesses.

Specimen stage

A flat adjustable stage capable of accepting either 4” or 6” wafers is mounted on a swinging arm stage, which rotates the stage under the targets to optimise coating.  Rotation speed is variable from 14 rpm to 38 rpm