Q300T ES Plus

• Capable of achieving vacuum of 5x10⁻⁵ mbar
• Single sputter head allows coating of samples up to 150 mm Ø
• Touch and swipe capacitive screen
• USB port for upgrades and download of process log files
• Multiple-user profiles can be set up on one instrument
• 16GB of memory can store more than 1000 recipes
• Multi-colour LED visual status indicator
• 1 x Chromium target as standard
• Capable of sputtering non-oxidizing and oxidizing metals e.g. Cr, Ir, W, Al, Ti, Au, Pt
• Capable of carbon rod evaporation (carbon fibre evaporation available as option)

• High resolution SEM E Large samples e.g Silicon Wafers (up to 150 mm)
• Protective platinum layers for FIB
• Carbon coating for elemental analysis and TEM

Product Information

• Single sputter head
• Large Chamber (300 mm Ø) E Pump-down Vacuum: 5x10 mbar
• Chromium and Carbon rod as standard

Instrument case

590 mm W x 535 mm D x 420 mm H (maximum height during the opening of the coating head: 772 mm)

Weight

36 kg (packed: 59 kg)

Packed dimensions

730 mm W x 630 mm D x 690 mm H

Work chamber

Borosilicate glass with integral PET implosion guard Size 300 mm outside diameter x 127 mm High

Display

115.5mm W x 86.4mm H (active area), 640 RGB x 480 (display format), capacitive touch colour display

User interface

Full graphical interface with touch screen buttons, includes features such as a log of the last 1000 coatings and reminders for when maintenance is due

Sputter target

Disc-style 57 mm Ø. A 0.5 mm thick chromium (Cr) is fitted as standard.

Specimen stage

A flat adjustable stage capable of accepting either 4” or 6” wafers is mounted on a swinging arm stage, which rotates the stage under the targets to optimise coating.  Rotation speed is variable from 14rpm to 38rpm