TriQ

• Turbomolecular pumped system with ultimate vacuum of 1x10⁻⁶ mbar, enabling high quality coatings
• Triple head design offering even deposition of thin film coatings across samples up to 8” in diameter
• Optimised planetary stages for deposition across 6” and 8” diameter samples
• Integrated Film Thickness Monitor (FTM) to control deposition of coating
• Intuitive and responsive touchscreen colour panel design
• Multi-colour LED visual status indicator offering process updates
• Pre-set recipes for standard protocols resulting in sample reproducibility
• Customisable recipes enabling users to tailor process parameters to their specific requirements
• Compatible with a range of target materials

Electron Microscopy

• High resolution imaging for detailed surface and structural analysis
• Enhanced surface conductivity for improved imaging performance
• Uniform fine-grained coatings for superior sample preparation
• Reduced charging effects and improved analytical accuracy

Materials Research

• Precision thin film deposition for advanced applications
• Controlled materials fabrication with consistent results
• Capability to process large-area substrates efficiently
• Support for research, development, and prototype production

Advanced Materials

• Novel batteries and fuel cells
• Development and study of quantum materials
• Semiconductor materials for electronics and microdevices
• Photonic materials for optical and communication systems

Instrument Specifications

• Unit weight: 52 Kg 
• Packed weight: 64 Kg (appoximatly)
• Instrument size: 440 mm (W) x 562 mm (H) x 551 mm (D) 
• Instrument size with chamber open: 440 mm (W) x 912 mm (H) x 551 mm (D)
• Chamber size: 300 mm Ø diameter, 220 mm (H) 
• Specimen stage: 80 mm (H) from chamber base (standard stage required for sputtering tall samples), 150 mm and 200mm Ø diameter substrate.
• 145mm (H) from chamber base (extended stage required for sputtering short samples), 150 mm and 200mm Ø diameter substrate.

Performance

• Ultimate vacuum: 1x10⁻⁶ mbar or lower 
• Operational vacuum: 5x10⁻⁶ mbar
• Vacuum gauge range: 1000 mbar to 6.7x10⁻⁹ mbar
• User interface: Touch screen colour display 

Power Supply

• Supply Voltage: 100-240 V, 50-60 Hz 
• Power Consumption (Incl. rotary pump): 1500 VA  

Deposition 

• Deposition Current: 1-150 mA 
• Deposition Rate: 0.1-20 nm/min (e.g. for gold) 
• Sputter Timer: 0-60 min 
• Sputter Target: Target Disc style, 57 mm Ø diameter x 0.3 mm thickness (chromium supplied as standard)

Film Thickness Monitor (FTM)

• Quartz crystal: Gold,12 mm Ø diameter, 5 MHz RC Quartz Crystals 
• Thickness range: 1-2000 nm 
• Tooling factor range: 0.1-10