Actively Cooled transfer device for transfer from Glovebox between SEM, FIB-SEM and Ion-Mill. For transfer under cryogenic conditions & high vacuum or at ambient temperatures under inert atmosphere.

Glovebox to Ion Mill with Cryogenic Stage 

Ion Mill with Cryogenic Stage to PP3006 

Ion Mill with Cryogenic Stage to PP3010 Prep Chamber 

All workflows can transfer in both directions

The Actively Cooled Transfer (ACT) is specifically designed for transferring delicate samples under both cryogenic conditions & high vacuum or at ambient temperatures under inert atmosphere. Its unique features include a built-in cold stage and an anti-contaminator, ensuring that sample integrity is maintained during the transfer process. The ACT is equipped with a solid Magdrive transfer rod and an attached cooling dewar, offering a highly accessible and portable solution for your needs. 

ACT Cryo Transfer 4pp Brochure_digital.pdf

Compatible with most makes and models of SEM and FIB-SEM

Can be interfaced with other devices, such as Ion Mills

Glovebox interfacing required for inert gas transfer 

Transferring materials sensitive to atmosphere, such as Battery and Fuel Cells 

Operates in conjunction with the PP3010 and PP3006 

Transfer in high vacuum in the region of 10-6 mbar

Overall dimensions W= 300 mm, L=881 mm, D= 303 mm 

Stage temperature ≤-160°C (in 30 mins) 

Vacuum level Transfer in high vacuum in the region of 10-6 mbar 

Operating pressure when interfacing with Glovebox ≤ 1 bar. 

Warranty 1-year warranty, with an extended warranty offer upon request 

Further Information The chart of Pressure vs Time (pump down time), the chart of Temperature (Stage and Anti-contaminator) vs Time and EDS results of Oxygen reduction using ACT for sample transfer are upon request. 

Configuration Interfacing required, please contact sales@quorumtech.com for more information.

Turbo pumped coater suitable for sputtering oxidising and non-oxidising metals, and carbon evaporation, designed for ultra-high-resolution SEM and FIB-SEM applications.

Ultra-high-resolution magnification SEM and FIB-SEM

The Q150V Plus is optimised for high-vacuum applications, with an ultimate vacuum of 1 x 10-6 mbar. Together with the use of a wide-range Penning/Pirani gauge, this enables the sputtering of oxidising metals with ultra-fine grain sizes, which are suitable for high resolution imaging - a combined system capable of both sputtering and carbon coating. The deposition head inserts can be swapped in seconds. Metal evaporation/aperture cleaning option available. 

QSeries New Brochure.pdf

16Gb of flash memory can store more than 1000 recipes

Multiple-user profiles can be set up on one machine

Capable of sputtering oxidizing and non-oxidizing metals e.g Cr, Ir, W, Al, Ti

(total height with coating head open: 650 mm)

115.5mm W x 86.4mm H (active area), 640 RGB x 480 (display format), capacitive touch colour display

Full graphical interface with touch screen buttons, includes features such as a log of the last 1000 coatings and reminders for when maintenance is due.

Disc-style 57 mm Ø. A 0.3 mm thick chromium (Cr) is fitted as standard. V S and V ES versions only

50 mm Ø rotation stage with rotation speed of 8-20 rpm. 

Turbo pumped coater suitable for sputtering oxidising and non-oxidising metals, designed for high resolution SEM and FIB-SEM applications.

High resolution SEM and FIB-SEM  Protective platinum layers for FIB 

The Q150T Plus has a turbomolecular pump. This enables the sputtering of oxidising metals, which have a lower grain size suitable for high-resolution imaging. Similarly, lower scattering allows for high purity, amorphous carbon films of high density - an automatic sputter coater for oxidising metals with ultra-fine grain size. Available sputtering targets include chromium, iridium and all noble metals

USB port for upgrades and download of process log files

16GB of memory can store more than 1000 recipes

Capable of achieving vacuum of 5 x 10 -5 mbar

Full graphical interface with touch screen buttons includes features such as a log of the last 1000 coatings and reminders for when maintenance is due.

Disc-style 57 mm Ø. 0.3 mm thick chromium (Cr) target is fitted as standard. T S and T ES versions only

50 mm Ø rotation stage with rotation speed of 8-20 rpm.

Turbo pumped coater with large chamber ideal for coating large samples up to 150 mm. Suitable for sputtering oxidising and non-oxidising metals, and carbon evaporation.

High resolution SEM E Large samples e.g Silicon Wafers (up to 150 mm)

Carbon coating for elemental analysis – replicas

The Q150T Plus has a turbomolecular pump. This enables the sputtering of oxidising metals, which have a lower grain size suitable for high-resolution imaging. Similarly, lower scattering allows for high purity, amorphous carbon films of high density.

Large Chamber (300 mm Ø) E Pump-down Vacuum: 5x10 mbar 

590 mm W x 535 mm D x 420 mm H (maximum height during the opening of the coating head: 772 mm)

Borosilicate glass with integral PET implosion guard Size 300 mm outside diameter x 127 mm High

Full graphical interface with touch screen buttons, includes features such as a log of the last 1000 coatings and reminders for when maintenance is due

Disc-style 57 mm Ø. A 0.3 mm thick chromium (Cr) is fitted as standard. 

A ﬂat adjustable stage capable of accepting either 4” or 6” wafers is mounted on a swinging arm stage, which rotates the stage under the targets to optimise coating.  Rotation speed is variable from 14rpm to 38rpm

Dual sputter head turbo pumped coater with large chamber ideal for coating large samples up to 200 mm with two metals. Suitable for sputtering oxidising and non-oxidising metals.

Large samples e.g Silicon Wafers (up to 200 mm Ø ) or multiple small samples

The Q300T T Plus is a large chamber, turbo-pumped coating system, ideally suited for sputtering a single large diameter specimen up to 8″/200mm or multiple smaller specimens over a similar diameter. Ideal for thin-film applications and SEM/FE-SEM. It is fitted with three sputtering heads to ensure even deposition of individual large specimens or multiple specimens.

590mm W x 535mm D x 420mm H (maximum height during the opening of the coating head: 772mm)

3x Disc-style 57 mm Ø. A 0.3 mm thick chromium (Cr) is fitted as standard. 

A ﬂat rotation stage for 6”(150mm) and 8” (200mm) wafers is ﬁtted  as standard.

A rotating/tilt stage and the  ‘rota cota’ rotary tilt stage are also options

NB: Please note it is not possible to sequentially sputter three different sputtering metals from each sputtering head – for sequential coating see the Q300T D Plus.

Semi-automated critical point dryer with built-in thermo-electric and adiabatic cooling.

The K850 combines versatility and ease of operation. Built-in thermo-electric heating and adiabatic cooling allow precise temperature control. The vertical pressure chamber (32 mm diameter x 47 mm) has a side viewing port, which gives a clear view of the liquid meniscus during filling. A magnetic stirrer ensures optimal mixing and exchange of process fluids.

Quorum Critical Point Dryer Product Brochure.pdf

Vertical chamber with top filling and bottom draining

Built-in adiabatic cooling and thermoelectric heating – accurate temperature control

Fine-control needle valve pressure let down – precise control of decompression avoids potential damage to specimens by uncontrolled pressure release

Built-in magnetic stirrer- enhanced solvent exchange

Pressure monitoring with safety cut-out for over pressure

Chamber: vertical, diameter 32mm, height 47mm with glass viewing port and safety shield

AL800019-1 Standard specimen holder with 12 individual specimens wells (each 8mm Ø x 8 mm H) 

EK4130 Holder for bulk specimens (a single large specimen container) 

EK4135 Glass microscope coverslip holder 

EK4145 Holder for porous specimen pots and 3 x pots 12.7mm x 15.5mm for small or delicate specimens 

CPD800A Porous specimen pots 12.7 mm x 15.5 mm (pack of 10 for small delicate specimens

Critical point dryer liquid carbon dioxide (CO₂) requirements All models require a cylinder of liquid CO₂ fitted with a siphon tube (normally indicated by a vertical white stripe on the cylinder). If there is any doubt regarding the presence of a siphon tube, advice should be sought from the supplier.

Cryo transfer systems for SEM, FIB-SEM, beamline, and vacuum platforms.

Cryo transfer systems for SEM, FIB-SEM, beamline and vacuum platforms.

Cryo Prep Solutions Brochure 2024.pdf

Ambient temperature airlock for SEM, FIB-SEM, beamline, and vacuum platforms.

Ambient temperature airlock for SEM, FIB-SEM, beamline and vacuum platforms.

Semi-automated critical point dryer optimised for drying of large samples such as wafers/MEMs (up to 8”).

The K850WM is a compact, bench-top instrument designed to critical point dry a complete 6”/152 mm wafer. A convenient wafer holder allows rapid transfer and ensures that pre-drying does not occur. 

Vertical chamber with top-loading and bottom-draining 

Fine control needle valve pressure release 

Temperature monitoring with safety cut-out for over pressure

Chamber size: 32 mm Ø x 47 mm H in dimension 

Chamber: vertical, diameter 32mm, height 47mm 

Large chamber critical point dryer for 4” or 6” wafers For a complete working system the following is required:

E4860 Recirculating heater/chiller for cooling chamber (please specify voltage) 

EK3102 Carbon dioxide bottle heating system. Allows faster filling of liquids CO₂ especially if the cylinder is stored in a cool environment

Critical point dryer liquid carbon dioxide (CO2 ) requirements All models require a cylinder of liquid CO2 fitted with a siphon tube (normally indicated by a vertical white stripe on the cylinder). If there is any doubt regarding the presence of a siphon tube, advice should be sought from the supplier.

Manual critical point dryer suitable for controlled drying of MEMs, hydrogels, and aerogels.

The E3100 large critical point dryer has been the industry standard for over 35 years and is used in numerous SEM laboratories around the world. Primarily used for the processing of life-sciences and geological specimens, the E3100 can also be used for the controlled drying of MEMS and aerogels.

Large, robust valves for draining of fluids, ingress of liquid CO₂ and venting of gas

Specimen handling - Temperature controlled by hot water (mains or E4860)

E3100-01 Specimen holder (boat). Included as standard with the E3100 E E3100 -02 Specimen holder (boat) for microscope coverslips 

E300-01 Holder for 3.05 mm TEM specimen grids 

CPD800A Porous pots with lids, 12.7 mm x 15.5 mm - E4860 Recirculating Heater Chiller to control heating and cooling cycle

Critical point dryer liquid carbon dioxide (CO2 ) requirements  All models require a cylinder of liquid CO2 fitted with a siphon tube (normally indicated by a vertical white stripe on the cylinder). If there is any doubt regarding the presence of a siphon tube, advice should be sought from the supplier.

Highly automated, column-mounted, gas-cooled cryo SEM preparation and cryo transfer system suitable for most makes and models of W-SEM, FE-SEM and FIB/SEM.

Material science such as Lithium battery and Semiconductors

Characterisation of samples with high moisture content including hydrogels, oleogels and bi-gels

Quorum Technologies’ PP3010 Cryo Sample Preparation System is compatible with most makes and models of SEM and FIB-SEM; the off-column gas-cooled system allows for a rapid thermal response. The preparation chamber design offers excellent visibility. The PP3010 gives users the ability to plunge freeze, fracture, sublime and coat samples in one easy to use system allowing for sample observation close to its native state.

The PP3010 Cryo Preparation System can be used as part of a workflow solution for maintaining lamella preparation and reverse vitreous transfer

Easy transfer between prep chamber and host instrument

Ability to transfer vitreous frozen samples under vacuum

Turbo-molecular pumped cryo preparation chamber

Nitrogen gas cooled cold stage, operating temperature, ambient to -190 °C

Column mounted Cryo preparation chamber with

Nitrogen gas cooled cold stage and anti-contaminator operating temperature, ambient to -190 °C

Large front window (150 mm x 76 mm) plus two top viewing ports

Automated, fine grain sputtering with Platinum (Pt) standard target

Off-column Cryo Heat Exchanger (CHE) when used with 30 litre LN2 dewar allows for maximum 24-hour operation (two gas lines) of the SEM stage (- 140 °C) and SEM anti-contaminator (- 175 °C)

Floor-mounted turbo pumping with flexible stainless steel vacuum connection to the preparation chamber

Single 5 m3/hr or equivalent vacuum pump required 

Slushed nitrogen freezing and sample handling system

Compatible for handling pre-frozen samples

Includes work area for sample preparation

Vacuum storage for sample transfer device and sample mounting fixture 

aQuilo® Software control via 15’’ touch-screen panel PC

User definable sublimation and coating recipes can be stored

Remote factory support via TeamViewer subject to internet connection

On-screen data logging, diagnostics and support video

Turbo pumped coater suitable for sputtering oxidising and non-oxidising metals, and carbon evaporation. Modular design enables vacuum chamber to be mounted into a glovebox.

Rotary pumped coater suitable for sputtering non-oxidising metals (Au, Au/Pd, Ag, Pt, and Pt/Pd), and carbon evaporation.

Rotary pumped coater Suitable for use with Tungsten/LaB⁶ SEM and Benchtop SEM - a combined system capable of both sputtering and carbon coating. The deposition head inserts can be swapped in seconds. Metal evaporation/aperture cleaning option available.

Capable of sputtering non-oxidizing metals e.g. Au, Pt , Pd, Au/Pd

USB port for upgrades and download of log files

New multi-colour LED visual status indicator

Interchangeable stage options and plug-in heads

Disc-style 57 mm Ø. 0.1 mm thick gold (Au) target is fitted as standard. R S and R ES versions only

Fully automated critical point dryer for reproducible results with minimal user intervention.

Automated control offering repeatable outcomes with minimal user intervention

Built-in adiabatic cooling for fast cool down rates allowing for more throughput

Easy-to-use and flexible software allowing for quick set-up of profiles

Status display to indicate process time remaining

Process driven, with individual user profiles for quick set-up time

Supplied with pre-set profiles covering different sample types

Screw top chamber for easy sample loading

Large viewing window ensuring observation of process flow

Small footprint ideal for use in fume hoods

Built-in safety devices in both hardware and software, including relief valves, level sensors, pressure switches and programming restraints

59 mm, usable chamber height = 34.5 mm, usable chamber volume = 97.5 ml

Critical point dryer liquid carbon dioxide (CO₂) requirements

All models require a cylinder of liquid CO₂ fitted with a siphon tube (normally indicated by a vertical white stripe on the cylinder). If there is any doubt regarding the presence of a siphon tube, advice should be sought from the supplier.

Turbo pumped coater suitable for carbon evaporation, designed for ultra-high-resolution SEM and FIB-SEM applications.

The Q150V Plus is optimised for high-vacuum applications, with an ultimate vacuum of 1 x 10-6 mbar. Together with the use of a wide-range Penning/Pirani gauge, this enables the sputtering of oxidising metals with ultra-fine grain sizes, which are suitable for high resolution imaging - an automatic sputter coater for oxidising metals with ultra-fine grain size. Available sputtering targets include chromium, iridium and all noble metals.

Turbo pumped coater suitable for sputtering oxidising and non-oxidising metals, and carbon evaporation, designed for high resolution SEM and FIB-SEM applications.

The Q150T Plus has a turbomolecular pump. This enables the sputtering of oxidising metals, which have a lower grain size suitable for high-resolution imaging. Similarly, lower scattering allows for high purity, amorphous carbon films of high density - a combined system capable of both sputtering and carbon coating. The deposition head inserts can be swapped in seconds. Metal evaporation/aperture cleaning option available.

Triple sputter head turbo pumped coater with large chamber ideal for coating large samples up to 200 mm with one metal. Suitable for sputtering oxidising and non-oxidising metals.

Large samples e.g Silicon Wafers (up to 200 mm Ø ) or multiple small samples Wafer inspection 

Multiple sample preparation for SEM E Thin-film applications and SEM/FE-SEM

Suitable for multi-layer sequential sputtering of two materials, the Q300T D Plus has two independent sputtering heads, which allows sequential sputtering of two metals without the need to break vacuum. The system is fully automated with user deﬁned recipes controlling the pumping sequence, time, number of sputter cycles, and the current used during the process. Unlimited layers of varying thickness from two target materials can be sputtered sequentially by cycling between both targets.  When not in use the targets are shuttered for protection from contamination.

 Pump-down Vacuum: 5x10-5 mbar E Chromium and Gold as standard

Disc-style 57 mm Ø. A 0.3 mm thick chromium (Cr) and 57 mm Ø. A 0.1 mm thick Gold (Au) is fitted as standard. 

A ﬂat adjustable stage capable of accepting either 4” or 6” wafers is mounted on a swinging arm stage, which rotates the stage under the targets to optimise coating.  Rotation speed is variable from 14 rpm to 38 rpm

Entry-level coater, equipped with rotary pump, suitable for sputter coating non-oxidising metals (Au, Au/Pd and Ag).

The MiniQS is ideally suited to the budget-conscious user who also demands reproducible results in an easy-to-use instrument. Suitable for most makes and model of W-SEM. 

MiniQS Brochure.pdf

Pre-set profiles with single-touch operation

Sputter head is hinged for easy operation

Detachable chamber with implosion guard and top-plate allowing for easy cleaning

Users can rapidly change the chamber to avoid cross-contamination

Automatic operation with minimal user intervention required

Compact sized; ideal for use with benchtop SEMs

Range of noble target options to suit majority of applications, including forensics

Possibility of coating samples to 50 mm diameter

225mm W x 420mm D325 x 325mm H (480mm H with the coating head open)

Disc-style 57 mm Ø 0.1mm thick gold (Au) target is included in the accessory pack

Gold/palladium (Au/Pd) and silver (Ag) target options available

You can purchase the instrument with a pump, or without. Please note, the MiniQS specifications are based on use with a Pfeiffer Duo 6 pump.

Easy-to-use single chamber glow discharge system suitable for surface modification of TEM grids.

Changing wettability of surfaces, primarily used for TEM grids to improve the spread of particles/ molecules on them , could also be used for SEM and AFM imaging when samples are applied onto substrate surfaces from liquid.

Designed with simplicity in mind, the easy-to-use MiniQ GD allows for surface modification of TEM grids. Resulting in the clear imaging of macromolecules.

MiniQ-GD-Brochure.pdf

Detachable chamber with implosion guard allowing for easy cleaning

Pre-set profiles with single touch operation

225 mm (Width) x 420 mm (Depth) x 325 mm (Height) (Total Height with coating head open 480 mm (H)

You can purchase the instrument with or without a pump. Please note, the MiniQ GD specifications are based on use with a Pfeiffer Duo 6 pump.

Cryo stage for SEM, FIB-SEM, beamline, and vacuum platforms.

Cryo stage for SEM, FIB-SEM, beamline and vacuum platforms.

Dual chamber in-air and chemical vapour glow discharge system suitable for surface modification of TEM grids.

Hydrophilisation and cleaning of TEM grids carbon support films for better sample spreading

Improved adhesion and orientation of proteins, nucleic acids and antibodies

TEM grid preparation for nanoparticle studies

The GloQube® Plus is a cost-effective, compact and easy to use glow discharge system, designed to fulfil the needs of laboratories with TEM. The primary application of the GloQube® Plus is to modify the surface of TEM grids in a way that it meets requirements for successful imaging of a variety of macromolecules. Integrated into one system, the two chambers enable the user maximum flexibility to choose which sample preparation technique they want to use: glow discharge in-air or in-chemical vapour, without downtime for cleaning or the risk of contamination and loss of samples.

GloQube-Plus-brochure.pdf

Second chamber for separating in-air and in-vapour processes

No cross-contamination between chambers due to post-process flush cycle

Automatic vapour delivery ensures reliable and reproducible results

Purge cycles reduce water vapour and oxygen concentrations, ensuring excellent yield of specifically orientated macromolecules

Adjustable slow vent time to minimize sample disturbance

Optional fast vent for rapid process times

Three level adjustable height sample stage ensures repeatable results

125 x 100 mm (4.9” x 3.94”) for two 25 x 75 mm (1” x 3”) slides and a 36 place grid holder

Adjustable 12.5 mm (0.5”), 22.5 mm (0.9”) or 35 mm (1.38”)

Rotary pumped coater suitable for sputtering non-oxidising metals (Au, Au/Pd, Ag, Pt, and Pt/Pd).

Rotary pumped coater Suitable for use with Tungsten/LaB⁶ SEM and Benchtop SEM - an automatic sputter coater for non-oxidising metals. Available sputtering targets including gold, gold/palladium and platinum.

The Q150V Plus is optimised for high-vacuum applications, with an ultimate vacuum of 1 x 10-6 mbar. Together with the use of a wide-range Penning/Pirani gauge, this enables the sputtering of oxidising metals with ultra-fine grain sizes, which are suitable for high resolution imaging - an automatic carbon coater (rod/cord) for TEM applications. For carbon coating TEM grids. 

Rotary pumped coater suitable for carbon evaporation.

Rotary pumped coater Suitable for use with Tungsten/LaB⁶ SEM and Benchtop SEM - an automatic carbon coater cord for TEM applications. For carbon coating TEM grids. 

Cryo

PP3010 Cryo Sample Preparation System

PP3006 CoolLok

PP3005 SEMCool

PP3004 QuickLok

Coating

Q150VES

Q150VE

Q150VS

Q150TES

Q150TE

Q150TS

Q150RES

Q150RE

Q150RS

Q150 GB

Critical Point Drying

Qdry

K850

K850 WM

E3100

Glow discharge

GloQube

MiniQ GD